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Method and device for thickness assessment

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Method and system for controlling the photolithography process

Optics: measuring and testing – By configuration comparison
Reexamination Certificate

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Method and system for evaluating integrity of adherence of a con

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Method and system for evaluating the quality of holograms

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Method and system for improving accuracy of critical...

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Method and system for measuring an inner diameter of a hole form

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Method and system to measure characteristics of a film...

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Method for apparatus for determining measurement parameter of a

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Method for calculating a scale relationship for an imaging...

Optics: measuring and testing – By configuration comparison – With object being compared and scale superimposed
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Method for calibrating a light traveling distance in a scanning

Optics: measuring and testing – By configuration comparison
Patent

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Method for characterizing defects on semiconductor wafers

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Method for characterizing defects on semiconductor wafers

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Method for characterizing defects on semiconductor wafers

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Method for checking cam lobe angles

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Method for checking semiconductor wafers and apparatuses for car

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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Method for checking wafers having a lacquer layer for faults

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Method for controlling the laying of a silicone string, particul

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Method for detecting obstructed nozzles

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Method for determining optical constants prior to film processin

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
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Method for determining solder quality

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
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