Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent
1995-04-20
1998-04-21
Pham, Hoa Q.
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
356237, G01B 1100
Patent
active
057423954
ABSTRACT:
In a method for checking semiconductor wafers and apparatuses for carrying out the method, a lacquer layer applied on a semiconductor wafer is checked. Initially, regions which are to be excluded from the check and surfaces which are to be checked, are ascertained. The checking is effected by direct illumination in such a way that the lacquer layer reflects light. The resulting values of the reflectance are determined and buffer-stored. A determination is performed for each surface as to whether or not it is to be accepted or rejected, in accordance with a predetermined evaluation criterion.
REFERENCES:
patent: 4740708 (1988-04-01), Batchelder
patent: 4929081 (1990-05-01), Yamamoto et al.
Ben El Mekki Manfred
Biedermann Ernst
Griebsch Thomas
Grieshop Matthias
Ross Gerhard
Greenberg Laurence A.
Lerner Herbert L.
Pham Hoa Q.
Siemens Aktiengesellschaft
LandOfFree
Method for checking semiconductor wafers and apparatuses for car does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for checking semiconductor wafers and apparatuses for car, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for checking semiconductor wafers and apparatuses for car will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2063512