Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate
2006-03-28
2006-03-28
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
C356S237500, C340S005900, C340S008100
Reexamination Certificate
active
07019835
ABSTRACT:
The present invention is directed to providing a method and system to measure characteristics of a film disposed on a substrate. The method includes identifying a plurality of processing regions on the film; measuring characteristics of a subset of the plurality of processing regions, defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.
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Choi Byung-Jin
McMackin Ian M.
Schumaker Phillip D.
Sreenivasan Sidlgata V.
Watts Michael P. C.
Carter Michael D.
Molecular Imprints, Inc.
Nguyen Sang H.
Toatley , Jr. Gregory J.
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