Method for checking wafers having a lacquer layer for faults

Details Method for checking wafers having a lacquer layer for faults Method for checking wafers having a lacquer layer for faults

1996-10-25

1998-10-20

Font, Frank G.

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

356237, 25055946, G01B 1100, G01N 1100, G01N 2100

Patent

active

058254994

ABSTRACT:
A wafer with a lacquer layer applied to it is checked automatically by lighting the wafer directly, so that the lacquer layer reflects the light. Resultant reflectance values of the reflected light are ascertained and buffer-stored and compared with corresponding values for a comparison wafer. It is ascertained whether the wafer is OK or defective from the result of the comparison in accordance with at least one predetermined judgment criterion.

REFERENCES:
patent: 3909602 (1975-09-01), Micka
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 4633504 (1986-12-01), Wihl
patent: 4954723 (1990-09-01), Takahashi et al.
patent: 4975972 (1990-12-01), Bose et al.
patent: 5506793 (1996-04-01), Straayer et al.

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