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Edge timing in an optical measuring apparatus

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Electro-optical measurement and focusing apparatus

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Electro-optical measuring system

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Electro-optical measuring system using precision light translato

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Electro-optical micrometer

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Electro-optical system for gauging surface profile deviations

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Electro-optical system for gauging surface profile deviations

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Electro-optical system for inspecting printed circuit boards

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Element recognition and orientation

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Elliptical laser probe for shadow mask

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Encapsulated measuring apparatus

Optics: measuring and testing – By configuration comparison – With relatively movable optical grids
Patent

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Endpoint detector and method for measuring a change in wafer thi

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Endpoint detector and method for measuring a change in wafer...

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Reexamination Certificate

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Exposure apparatus

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Exposure apparatus

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Exposure apparatus with thickness and defect detection

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Exterior view inspecting apparatus for circuit board

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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