Method and system for improving accuracy of critical...

Details Method and system for improving accuracy of critical... Method and system for improving accuracy of critical...

2007-02-23

2009-08-25

Stafira, Michael P (Department: 2886)

Optics: measuring and testing

By configuration comparison

With comparison to master, desired shape, or reference voltage

Reexamination Certificate

active

07580129

ABSTRACT:
A method for improving accuracy of optical critical dimension measurement of a substrate is provided. A process parameter that influences the refractive index and extinction coefficient of a thin film in the substrate is identified. A refractive index and extinction coefficient across a plurality of wavelengths as a function of the process parameter is identified. During the regression modeling of the optical critical dimension measurement, the refractive index and extinction coefficient across the plurality of wavelengths is adjusted through the function via the process parameter.

REFERENCES:
patent: 5905573 (1999-05-01), Stallard et al.
patent: 6869739 (2005-03-01), Ausschnitt et al.
patent: 7042551 (2006-05-01), Ausschnitt

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