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In-situ endpoint detection for membrane formation

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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In-situ measurement of a thin film deposited on a wafer

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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In-situ real-time monitoring technique and apparatus for...

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Reexamination Certificate

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Inspecting method for mask for producing semiconductor device

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Inspection apparatus of electronic component

Optics: measuring and testing – By configuration comparison – With two images of single article compared
Patent

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Inspection device for measuring a geometric dimension of a part

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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Inspection method and apparatus, lithographic apparatus,...

Optics: measuring and testing – By configuration comparison – With projection on viewing screen
Reexamination Certificate

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Inspection method for a correction pattern

Optics: measuring and testing – By configuration comparison
Patent

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Inspection method of circuit substrate

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection method, apparatus and system for circuit pattern

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Reexamination Certificate

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Inspection system for original with pellicle

Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent

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Instrument for measuring lengths

Optics: measuring and testing – By configuration comparison – With relatively movable optical grids
Patent

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Interferometric JFTOT tube deposit measuring device

Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent

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