Inspection method for a correction pattern

Details Inspection method for a correction pattern Inspection method for a correction pattern

1998-08-17

2000-01-18

Font, Frank G.

Optics: measuring and testing

By configuration comparison

356384, 356237, G01B 1100

Patent

active

060162015

ABSTRACT:
An inspection method for a correction pattern includes the following steps. An optical proximity correction is performed to an original pattern to obtain an optical proximity correction pattern. An "exclusive or" logic operation is done to the original pattern and the optical correction pattern to obtain an inspection pattern. The inspection pattern includes a number of kinds of line width sizing. The line width sizing of the inspection pattern is then compared with an optical correction reference size.

REFERENCES:
patent: 5546225 (1996-08-01), Shiraishi

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