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Silicon oxynitride passivated semiconductor body and method of m

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Silicon single crystal wafer, epitaxial silicon wafer, and...

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Reexamination Certificate

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Silicon wafer and silicon epitaxial wafer and production...

Metal treatment – Barrier layer stock material – p-n type – Having at least three contiguous layers of semiconductive...
Reexamination Certificate

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Silicon wafers for producing oxide layers of high breakdown stre

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Silicon wafers having controlled precipitation distribution

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
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Silicon-impregnated foraminous sheet

Metal treatment – Barrier layer stock material – p-n type
Patent

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Silicon-on-insulator islands

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Reexamination Certificate

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Silicon-on-silicon hybrid wafer assembly

Metal treatment – Barrier layer stock material – p-n type – Having at least three contiguous layers of semiconductive...
Patent

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Single crystal films of cubic group II fluorides on semiconducto

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Single crystal silicon

Metal treatment – Barrier layer stock material – p-n type
Patent

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Single crystal silicon substrate

Metal treatment – Barrier layer stock material – p-n type – With recess – void – dislocation – grain boundaries or channel...
Patent

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Single crystal silicon wafer having an epitaxial layer...

Metal treatment – Barrier layer stock material – p-n type – With contiguous layer doped to degeneracy
Reexamination Certificate

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SOI (silicon on insulator) substrate with enhanced gettering eff

Metal treatment – Barrier layer stock material – p-n type – Having at least three contiguous layers of semiconductive...
Patent

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SOI substrate having monocrystal silicon layer on insulating fil

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Solid diffusion source of GD oxide/P205 compound and method of m

Metal treatment – Barrier layer stock material – p-n type
Patent

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SOS island edge passivation structure

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Spacers used to form isolation trenches with improved corners

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Spacers used to form isolation trenches with improved corners

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon
Patent

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Stacked polycrystalline silicon film of high and low conductivit

Metal treatment – Barrier layer stock material – p-n type – With contiguous layer doped to degeneracy
Patent

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Strained defect-free epitaxial mismatched heterostructures and m

Metal treatment – Barrier layer stock material – p-n type
Patent

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