Single crystal films of cubic group II fluorides on semiconducto

Metal treatment – Barrier layer stock material – p-n type – With non-semiconductive coating thereon

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148 334, 148DIG53, 148DIG81, 148DIG169, 357 4, 357 2315, 357 237, 437 84, 437105, 437243, 437962, H01L 29201, H01L 2978

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048789569

ABSTRACT:
Certain semiconductor device structures are described in which single crystal layers of cubic Group II fluorides cover at least part of the surface of III-V semiconductor compound. The fluoride crystal has a cubic structure and may be lattice matched or lattice mismatched to the compound semiconductor substrate depending on fluoride composition. These fluoride single crystal layers are put down by a moleuclar beam epitaxy procedure using certain critical substrate temperature ranges and a particular cleaning procedure.

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patent: 3692572 (1972-09-01), Strehlow
patent: 4453172 (1984-06-01), Farrow
"Insulating Epitaxial Films of BaF.sub.2, CaF.sub.2 and Ba.sub.x Ca.sub.1-x F.sub.2 Grown by MBE on InP Substrates", Journal of Crystal Growth, 60, P. W. Sullivan et al, 1982, pp. 403-413.
"MBE-Grown Fluoride Films: A New Class of Epitaxial Dielectrics" Journal of Vacuum Science and Technology, 19(3), Farrow et al, 1981, pp. 415-420.
"Epitaxial Growth of Lattice Matched Group II Fluorides on GaAs Substrates" Second European Workshop on Molecular Beam Epitaxy, C. Fontaine et al, 1983, Abstract.
Heterostructure Lasers: Part B-Materials and Operating Characteristics, H. C. Casey, Jr. et al, 1978, Academic Press, New York, Chapter 5.
"Growth of Single-Crystalline epitaxial Group II Fluoride Films on InP(001) by Molecular-Beam Epitaxy", Journal of the Electrochemical Society 130(10), C. W. Tu et al, 1983, pp. 2081-2087.

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