LandOfFree - US Patents - Listing for Etching a substrate: processes,Masking of a substrate using material resistant to an etchant,Mask is multilayer resist

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Electrochemical method to improve MR reader edge definition...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Etching method, etched product formed by the same, and...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Intermediate layer lithography

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method for forming micro patterns of semiconductor devices

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method for preventing the etch transfer of sidelobes in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method for producing tapered waveguide

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method of etching and etch mask

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method of etching organic antireflection coating (ARC) layers

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Method of post-etching a mechanically treated substrate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Multilayer resist pattern forming method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Reduction of reflection by amorphous carbon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Reduction of reflection by amorphous carbon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Solder mask for manufacture of printed circuit boards

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Structure and method including dry etching techniques for formin