4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask is multilayer resist
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Method for forming micro patterns of semiconductor devices

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Patent

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Method for preventing the etch transfer of sidelobes in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Reexamination Certificate

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Method for producing tapered waveguide

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Patent

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Method of etching and etch mask

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Reexamination Certificate

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Method of etching organic antireflection coating (ARC) layers

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method of post-etching a mechanically treated substrate

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Multilayer resist pattern forming method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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