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Low pressure reactive magnetron sputtering apparatus and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Low temperature growth of oriented carbon nanotubes

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Low temperature integrated via and trench fill process and appar

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Low temperature zirconia based thermal barrier layer by PVD

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Low temperature zirconia based thermal barrier layer by PVD

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Low thermal expansion clamping mechanism

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Low-k BSG gap fill process using HDP

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Low-pressure processing system for magnetic orientation of...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnet design for a sputtering chamber

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic array for sputtering system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic device for rotating a substrate

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic disc and method of manufacturing same

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic disk and magnetic disk manufacturing method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic disk comprising a first carbon overcoat having a...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic disk comprising a first carbon overcoat having a...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic field generator, coating method and apparatus including

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic film forming method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic film forming method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic head having high conductivity lead structures...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Magnetic head manufacturing method using sputtering apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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