Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1999-03-08
2000-03-14
Diamond, Alan
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419211, 20419215, 20419222, 20419212, 428692, 428694T, 427569, 427576, 427571, 427580, 427599, H01F 1000
Patent
active
06036825&
ABSTRACT:
In a magnetic film forming method, a plurality of chips formed of Fe.sub.3 O.sub.4 and a plurality of chips formed of HfO.sub.2 are disposed on a target formed of Fe. The composition ratio of a Fe--Hf--O film can be set within a proper range by adjusting the numbers of the up said two kind of chips.
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Ahn et al, IBM Technical Disclosure Bulletin S1508, vol. 13, No. 10, Mar. 1971.
Hatanai Takashi
Makino Akihiro
Nakazawa Makoto
Sasaki Yoshito
Umetsu Eiji
Alps Electric Co. ,Ltd.
Diamond Alan
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