Magnetic head manufacturing method using sputtering apparatus

Details Magnetic head manufacturing method using sputtering apparatus Magnetic head manufacturing method using sputtering apparatus

1996-11-12

1998-02-17

Breneman, R. Bruce

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, C23C 1434

Patent

active

057188122

ABSTRACT:
A method of manufacturing a magnetic head in which magnetic metal thin films are respectively formed on opposed faces of a pair of magnetic core halves made of a magnetic oxide and abut against each other across a magnetic gap, includes the steps of preparing an opposed-target type sputtering apparatus, holding a magnetic oxide block on a holding member, and forming, while rotating the holding member, the magnetic metal thin film on an end face of the magnetic oxide block which constitutes one of the opposed faces, in an argon gas containing any one of nitrogen, oxygen and carbon dioxide. A direction of rotation of the holding member is made substantially coincident with a track-width direction of the opposed face.

REFERENCES:
patent: 4288307 (1981-09-01), Wasa et al.
patent: 4767516 (1988-08-01), Nakatsuka et al.
patent: 5000834 (1991-03-01), Yoshikawa
patent: 5328583 (1994-07-01), Kameyama et al.

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