Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2011-08-09
2011-08-09
McDonald, Rodney G (Department: 1724)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C427S129000, C427S130000, C427S131000, C427S132000
Reexamination Certificate
active
07993497
ABSTRACT:
In a magnetic disk having at least a glass substrate, a plurality of underlayers formed over the glass substrate, and a magnetic layer formed over the plurality of underlayers, at least one of the underlayers is an amorphous underlayer containing a VIa group element and carbon and, given that the remanent magnetization in a circumferential direction of the disk is Mrc and the remanent magnetization in a radial direction of the disk is Mrr, the magnetic disk has a magnetic anisotropy in which Mrc/Mrr being a ratio between Mrc and Mrr exceeds 1.
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Ang Chor Boon
Moroishi Keiji
McDonald Rodney G
WD Media (Singapore) Pte. Ltd.
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