Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-11-17
1996-05-21
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20419215, 20429811, C23C 1434, C23C 1456
Patent
active
055185940
ABSTRACT:
This invention concerns a pane having a film, the light transmission of which varies as a function of the direction of the incident light. The deposition technique is cathodic sputtering. It uses, between the cathode 1 and the substrate 4, a guide 6 which channels the particles.
REFERENCES:
patent: 4006073 (1977-02-01), Welch
patent: 4472259 (1984-09-01), Class et al.
patent: 4497700 (1985-02-01), Groth et al.
patent: 5080774 (1992-01-01), Heitzer
patent: 5114556 (1992-05-01), Lamont, Jr.
patent: 5242560 (1993-09-01), Lingle et al.
Journal of Applied Physics, vol. 67, No. 2, pp. 1030-1036, Jan. 15, 1990, Y. Gotoh, et al., "Structures and Properties of Chromium Thin Films Prepared by Anisotropic-Emission-Effect Sputter Deposition".
Bernard Claude
Marcquart Philippe
Breneman R. Bruce
Mc Donald Rodney G.
Saint -Gobain Vitrage International
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