P1 notched write head with minimum overmilled p1 and p2

Details P1 notched write head with minimum overmilled p1 and p2 P1 notched write head with minimum overmilled p1 and p2

1997-05-06

1999-06-29

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2960301, 2960313, 2960315, 216 22, 216 27, 20419235, 20419215, C23C 1434, G11B 5187, G11B 5127

Patent

active

059164239

ABSTRACT:
A magnetic head is provided which has first and second notches in a first pole piece layer adjacent first and second corners at the base of a gap layer wherein the gap layer does not undercut a base of a second pole tip. Field regions of the first pole piece layer which extend from the first and second notches slope upwardly from the notches for protecting components below the first pole piece layer. In one aspect of the invention a method of defining the gap layer sputter deposition and ion milling steps are employed to form a protective layer on first and second side walls of the second pole tip so that unwanted portions of the gap layer can be removed without undercutting the gap layer below the base of the second pole tip. In another aspect of the invention a method of making the first and second notches by sputter deposition and etching are employed to define a protective layer with first and second openings where the first and second notches are to be formed following by ion milling which mills through the openings through the notches until the protective layer is consumed.

REFERENCES:
patent: 4436593 (1984-03-01), Osborne et al.
patent: 4652954 (1987-03-01), Church
patent: 4992901 (1991-02-01), Keel et al.
patent: 5141623 (1992-08-01), Cohen et al.
patent: 5336586 (1994-08-01), Togawa et al.
patent: 5353182 (1994-10-01), Nakamura et al.
patent: 5393376 (1995-02-01), Chen et al.
patent: 5438747 (1995-08-01), Krounbi et al.
patent: 5462637 (1995-10-01), Thiele
patent: 5484075 (1996-01-01), Kimura et al.
patent: 5527663 (1996-06-01), Togawa et al.
patent: 5554303 (1996-09-01), Kaneko et al.
patent: 5578342 (1996-11-01), Tran et al.
patent: 5804085 (1998-09-01), Wu et al.
patent: 5809637 (1998-09-01), Rottmayer
Anonymous, "Self-Aligned, Low-Aspect Ratio Ion Milling Mask", Research Disclosure, Jun. 1990, No. 31480.

Affiliated with

Also associated with

Rating

P1 notched write head with minimum overmilled p1 and p2 does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with P1 notched write head with minimum overmilled p1 and p2, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and P1 notched write head with minimum overmilled p1 and p2 will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1373031