Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1985-10-28
1987-05-12
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419211, 20419212, 20419231, 20419234, 204298, 250423P, 250425, C23C 1400
Patent
active
046647694
ABSTRACT:
Plasma enhancement is achieved in a plasma glow system by increasing the number of photoelectric electrons in the plasma glow by producing photoelectrons from the surface of a target in the system by the use of a radiation source. This is more particularly accomplished by flooding the surface of the target with a UV laser beam during the plasma process where emitted photoelectrons are injected into the plasma to increase the plasma density.
The plasma enhancement is used in a sputter etching/deposition system which includes a chamber containing a cathode, a target, a substrate platform containing substrate and a pump. An ultraviolet light source such as a UV laser and focussing optics for focussing the UV radiation onto the target through a UV transmission window are also provided. A plasma region in the chamber is enhanced by photons from the laser striking the target and producing photoelectrons which are injected into the plasma to increase its density.
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Cuomo Jerome J.
Guarnieri Charles R.
Demers Arthur P.
Goodwin John J.
International Business Machines - Corporation
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