Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-05-05
1999-01-26
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419213, 20429803, 20429808, 20429806, C23C 1434
Patent
active
058633928
ABSTRACT:
An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.
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Drummond Geoffrey N.
Scholl Richard A.
Advanced Energy Industries Inc.
McDonald Rodney G.
Nguyen Nam
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