Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-04-17
2007-04-17
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192130, C204S298030
Reexamination Certificate
active
10839160
ABSTRACT:
A process for fabricating a patterned medium including a dot-forming step for forming a dot array constituted by sample magnetic dots having a predetermined size such as a single domain particle size determined theoretically from the magnetic metal thin for a sample medium having a magnetic metal film formed with the initial conditions; a demagnetization step for AC-demagnetizing the dot array; a ratio measurement step for measuring the ratio of single magnetic domains by observing the magnetic pattern of each of the sample dots after the AC-demagnetization; and an adjustment step for determining conditions of the sputtering apparatus for forming a solid state magnetic metal thin film by adjusting the film-forming conditions such that the ratio of the single magnetic domains equals to or exceeds a predetermined value.
REFERENCES:
patent: 2001-110050 (2001-04-01), None
patent: 2002-109712 (2002-04-01), None
patent: 2003-203333 (2003-07-01), None
Moritz et al. “Domain structure in magnetic dots prepared by nanoimprint and e-beam lithography”, Journal of Applied Physics, vol. 91, No. 10, May 15, 2002, pp. 7314-7316.
Schneider et al. “Magnetization loops of submicron ferromagnetic permalloy dot arrays”, Journal of Applied Physics, vol. 86, No. 8, Oct. 15, 1999, pp. 4539-4543.
Moritz et al. “Writing and reading bits on pre-patterned media”, Applied Physics Letters, vol. 84, No. 9, Mar. 1, 2004, pp. 1519-1521.
Kitade Yasuhiro
Komoriya Hitoshi
Armstrong Kratz Quintos Hanson & Brooks, LLP
Fujitsu Limited
McDonald Rodney G.
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