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Integrated sputtering target assembly

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Interference layer system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Interference layer system

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Interlayer dielectric process

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Intermediate layer material of three-layer resist system and met

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Inverted magnetron

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion assisted deposition process including reactive source gassif

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion beam deposition targets having an interlocking interface...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion beam for target recovery

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion beam induced sputtered multilayered magnetic structures

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion beam modification of residual stress gradients in thin...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion beam processing method and apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion beam sputtering apparatus, method for forming a...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion implantation of thin film CrSi.sub.2 and SiC resistors

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion vapour deposition apparatus and method

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion-assisted magnetron deposition

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion-beam machining method and apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion-beam source with channeling sputterable targets and a...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ion-beam sputtering apparatus and method for operating the same

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Ionization film-forming method and apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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