Ion-beam sputtering apparatus and method for operating the same

Details Ion-beam sputtering apparatus and method for operating the same Ion-beam sputtering apparatus and method for operating the same

1991-05-10

1993-01-12

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429804, C23C 1446

Patent

active

051787385

ABSTRACT:
An ion-beam sputtering apparatus using an insulator target and a method for operating the same which is characterized by interposing a conductor film forming process during the ion beam processings using the insulator target. This conductor film formation prevents undesired charge build up on the inside of the apparatus and prevents undesired occurrence of abnormal discharge in the ion beam processing using an insulator as a target.

REFERENCES:
patent: 4793908 (1988-12-01), Scott et al.

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