Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-03-17
1990-06-26
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
156345, 156643, 2504923, 20429836, C23F 102
Patent
active
049369687
ABSTRACT:
In an ion-beam machining method and apparatus of effecting sputtering by deflecting a focused ion beam and scanning it on a material surface, the relationship between the diameter d of the beam on the material surface and the height h of a stepped portion formed by each beam scan is changed from h.gtoreq.d to h<<d in accordance with an increase in the depth of a hole which is being formed, to thereby control the number of sputtered particles redeposited on side walls of the hole. The apparatus includes a deflection controller for controlling an ion beam deflector and blanking electrode so as to change the above-mentioned relationship between d and h.
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L. R. Harriott et al., J. Vac. Sci. Technol., vol. B5 (1), Jan./Feb. 1987, pp. 207-210.
Ishitani Tohru
Kawanami Yoshimi
Ohnishi Tsuyoshi
Hitachi , Ltd.
Weisstuch Aaron
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