Ion beam processing method and apparatus

Details Ion beam processing method and apparatus Ion beam processing method and apparatus

1991-09-27

1993-06-29

Dang, Thi

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429836, 156643, H01J 2700

Patent

active

052231097

ABSTRACT:
There is disclosed an ion beam processing method of processing a rotating workpiece for a very small-size rotary member, using an ion beam or a focused ion beam. Apparatus for performing this method is also disclosed. In the formation of a product having a non-circular cross-section, when the amount of application of the ion beam is kept constant, the rotational angular velocity of the workpiece is varied in accordance with the rotational angular position of the workpiece. On the other hand, when the rotational angular velocity of the workpiece is kept constant, the amount of application of the ion beam is varied. When it is difficult to align the axis of the workpiece with the axis of rotation of a workpiece holder, the focused ion beam is applied in accordance with the oscillation of the workpiece.

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Crow et al, "The Use of Vector Scanning for Producing Arbitrary Surface Contours with a Focused Ion Beam", J. Vac. Sci. Technol., B6(5) Sep./Oct. 1988.

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