Ion beam modification of residual stress gradients in thin...

Details Ion beam modification of residual stress gradients in thin... Ion beam modification of residual stress gradients in thin...

2005-08-16

2005-08-16

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192320, C204S298360, C216S066000

Reexamination Certificate

active

06929721

ABSTRACT:
Method and apparatus for reducing the curvature of a micromachined structure having lamella (12). Surface treatment by an ion beam (30) of the lamella (12) such as by sputtering removes regions of stress allowing the lamella (12) to return to a planar condition. The resulting outer surface is made suitable for use as a reflector and other purposes needing a substantially planar surface.

REFERENCES:
patent: 4756796 (1988-07-01), Saitou
patent: 5922212 (1999-07-01), Kano et al.
patent: 6529311 (2003-03-01), Bifano et al.
patent: 198 14 760 (1999-10-01), None
patent: 19814760 (1999-10-01), None
patent: 63-84114 (1988-04-01), None
patent: 3-103391 (1991-04-01), None

Affiliated with

Also associated with

Rating

Ion beam modification of residual stress gradients in thin... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion beam modification of residual stress gradients in thin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion beam modification of residual stress gradients in thin... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3509016