4. Semiconductor device manufacturing: process
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Atomic layer deposition of copper using a reducing gas and...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Atomic layer deposition of GdScO3 films as gate dielectrics

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Atomic layer deposition of hafnium lanthanum oxides

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Atomic layer deposition of hafnium-based high-k dielectric

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Atomic layer deposition of interpoly oxides in a...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Atomic layer deposition of metallic contacts, gates and...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Atomic layer deposition of tantalum based barrier materials

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Atomic layer deposition of tantalum-containing materials...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Atomic layer deposition of titanium using batch type chamber...

Semiconductor device manufacturing: process – Making passive device – Stacked capacitor
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Atomic layer deposition of tungsten materials

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Atomic layer deposition of Zr 3 N 4 /ZrO 2 films as gate...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Atomic layer deposition of Zr x Hf y Sn 1-x-y O 2 films...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Atomic layer deposition of Zr x Hf y Sn 1-x-y O 2 films...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Atomic layer deposition processes for non-volatile memory...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Atomic layer deposition processes for non-volatile memory...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Atomic layer deposition systems and methods including metal...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Atomic layer deposition systems and methods including...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Atomic layer deposition tantalum nitride layer to improve...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Atomic layer deposition using photo-enhanced bond...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Atomic layer doping apparatus and method

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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