Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
Reexamination Certificate
2005-06-28
2008-08-26
Hoang, Quoc D (Department: 2892)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Multiple layers
C438S789000, C257SE21269, C257SE21274
Reexamination Certificate
active
07416994
ABSTRACT:
The present invention provides atomic layer deposition systems and methods that include metal compounds with at least one β-diketiminate ligand. Such systems and methods can be useful for depositing metal-containing layers on substrates.
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Hoang Quoc D
Micro)n Technology, Inc.
Mueting Raasch & Gebhardt, P.A.
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