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High density plasma chemical vapor deposition (HDP-CVD)...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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High density plasma chemical vapor deposition apparatus and...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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High density plasma chemical vapor deposition process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High density plasma chemical vapor deposition process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High density plasma chemical vapor deposition process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High density plasma enhanced chemical vapor deposition process i

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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High density plasma etching of metallization layer using chlorin

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High density plasma gapfill deposition-etch-deposition...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High density plasma nitridation as diffusion barrier and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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High density plasma oxide gap filled patterned metal layers with

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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High density plasma passivation layer and method of application

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High density plasma process for optimum film quality and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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High density plasma process for silicon thin films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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High density plasma process for the formation of silicon...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High density pluggable connector array and process thereof

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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High density programmable read-only memory employing...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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High density read only memory and fabrication method thereof

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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High density ROM and a method of making the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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High density selective SiO.sub.2 :Si.sub.3 N.sub.4 etching using

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High density semiconductor package and method of fabrication

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Assembly of plural semiconductive substrates each possessing...
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