Controlled collapse chip connection (C4) integrated circuit...
Controlled composition using plasma-enhanced atomic layer...
Controlled doping of semiconductor nanowires
Controlled dry etch of a film
Controlled electroless plating
Controlled etching of oxides via gas phase reactions
Controlled faceting of source/drain regions
Controlled fracture substrate singulation
Controlled gate length and gate profile semiconductor device...
Controlled growth of highly uniform, oxide layers,...
Controlled growth of larger heterojunction interface area...
Controlled isotropic etch process and method of forming an openi
Controlled linewidth reduction during gate pattern formation usi
Controlled linewidth reduction during gate pattern formation usi
Controlled method of silicon-rich oxide deposition using...
Controlled nanowire growth in permanent, integrated...
Controlled oxide growth and highly selective etchback technique
Controlled oxide growth over polysilicon gates for improved...
Controlled potential anodic etching process for the...
Controlled process and resulting device