Use of deuterated materials in semiconductor processing
Use of diamond as a hard mask material
Use of dilute steam ambient for improvement of flash devices
Use of disposable spacer to introduce gettering in SOI layer
Use of dummy poly spacers and divot fill techniques for...
Use of etch to blunt gate corners
Use of functional memory cells as guard cells in a...
Use of gate electrode workfunction to improve DRAM refresh
Use of high-K dielectric material in modified ONO structure...
Use of in-situ HCL etch to eliminate by oxidation...
Use of indium to define work function of p-type doped...
Use of mask shadowing and angled implantation in fabricating...
Use of MEV implantation to form vertically modulated N+ buried l
Use of poly resistor implant to dope poly gates
Use of sacrificial dielectric structure to form...
Use of selective epitaxial silicon growth in formation of...
Use of selective oxidation to form asymmetrical oxide...
Use of selective oxidation to form asymmetrical oxide...
Use of selective oxidation to improve LDMOS power transistors
Use of Si-rich oxide film as a chemical potential barrier...