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Carbon doped epitaxial layer for high speed CB-CMOS

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
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Carbon-on-insulator substrates by in-place bonding

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Charge-free low-temperature method of forming thin...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Chemical mechanical polishing for forming a shallow trench...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from liquid combined with subsequent diverse...
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Chemical vapor deposition (CVD) method employing wetting...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Circuit substrate and fabrication method thereof

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Clean process for an electron beam source

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Clean process for an electron beam source

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Complementary bipolar/CMOS epitaxial structure and process

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
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Complementary thin film transistor circuit, electro-optical...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Compound crystal and method of manufacturing same

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Compound semiconductor device having a reduced source...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
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Compound semiconductor device using SiC substrate and its...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Plural fluid growth steps with intervening diverse operation
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Compound semiconductor material and method for forming an...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Continuous feed chemical vapor deposition

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
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Controlled cleavage process and resulting device using beta anne

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Controlled cleavage process and resulting device using beta...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Controlled composition using plasma-enhanced atomic layer...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Controlled doping of semiconductor nanowires

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Controlled nanowire growth in permanent, integrated...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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