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Edge growth heteroepitaxy processes with reduced lattice...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Efficient body contact field effect transistor with reduced...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Electrical fuse having a fully silicided fuselink and...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Electro-optical device, method of manufacturing the same,...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Polycrystalline semiconductor
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Electroless epitaxial etching for semiconductor applications

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Electronically addressable microencapsulated ink and display...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Elimination of dehydrogenation step when forming a silicon thin

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Enhanced crystallization of amorphous films

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Enhancement of P-type metal-oxide-semiconductor field effect...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Epitaxial and polycrystalline growth of Si1-x-yGexCy and...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Epitaxial cleaning process using HCL and N-type dopant gas...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
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Epitaxial deposition of doped semiconductor materials

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Epitaxial growth method

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Epitaxial growth of aligned AlGalnN nanowires by...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Epitaxial plasma enhanced chemical vapor deposition (PECVD)...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Epitaxial semiconductor deposition methods and structures

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Epitaxial semiconductor deposition methods and structures

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Epitaxial semiconductor deposition methods and structures

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
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Epitaxial SiOx barrier/insulation layer

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
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Epitaxially coated semiconductor wafer and device and method...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
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