Apparatus and method for transformation of substrate

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S483000, C438S798000

Reexamination Certificate

active

07618880

ABSTRACT:
A method is disclosed for forming a layer of a wide bandgap material in a non-wide bandgap material. The method comprises providing a substrate of a non-wide bandgap material and converting a layer of the non-wide bandgap material into a layer of a wide bandgap material. An improved component such as wide bandgap semiconductor device may be formed within the wide bandgap material through a further conversion process.

REFERENCES:
patent: 4446169 (1984-05-01), Castle et al.
patent: 4912063 (1990-03-01), Davis et al.
patent: 4912064 (1990-03-01), Kong et al.
patent: 5145741 (1992-09-01), Quick
patent: 5391841 (1995-02-01), Quick
patent: 5698472 (1997-12-01), Harris
patent: 5793042 (1998-08-01), Quick
patent: 5837607 (1998-11-01), Quick
patent: 5889234 (1999-03-01), Ghosh et al.
patent: 6025609 (2000-02-01), Quick
patent: 6054375 (2000-04-01), Quick
patent: 6242784 (2001-06-01), Zeng et al.
patent: 6271576 (2001-08-01), Quick
patent: 6391748 (2002-05-01), Temkin et al.
patent: 6670693 (2003-12-01), Quick
patent: 6703294 (2004-03-01), Schoner et al.
patent: 6838395 (2005-01-01), Kanzawa et al.
patent: 2004/0053438 (2004-03-01), Abe et al.
patent: 358095830 (1983-06-01), None
patent: 405024975 (1993-02-01), None
patent: 2002128596 (2002-05-01), None
patent: 2004018009 (2002-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for transformation of substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for transformation of substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for transformation of substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4099128

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.