Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
Reexamination Certificate
2005-02-18
2009-11-17
Mulpuri, Savitri (Department: 2812)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
C438S483000, C438S798000
Reexamination Certificate
active
07618880
ABSTRACT:
A method is disclosed for forming a layer of a wide bandgap material in a non-wide bandgap material. The method comprises providing a substrate of a non-wide bandgap material and converting a layer of the non-wide bandgap material into a layer of a wide bandgap material. An improved component such as wide bandgap semiconductor device may be formed within the wide bandgap material through a further conversion process.
REFERENCES:
patent: 4446169 (1984-05-01), Castle et al.
patent: 4912063 (1990-03-01), Davis et al.
patent: 4912064 (1990-03-01), Kong et al.
patent: 5145741 (1992-09-01), Quick
patent: 5391841 (1995-02-01), Quick
patent: 5698472 (1997-12-01), Harris
patent: 5793042 (1998-08-01), Quick
patent: 5837607 (1998-11-01), Quick
patent: 5889234 (1999-03-01), Ghosh et al.
patent: 6025609 (2000-02-01), Quick
patent: 6054375 (2000-04-01), Quick
patent: 6242784 (2001-06-01), Zeng et al.
patent: 6271576 (2001-08-01), Quick
patent: 6391748 (2002-05-01), Temkin et al.
patent: 6670693 (2003-12-01), Quick
patent: 6703294 (2004-03-01), Schoner et al.
patent: 6838395 (2005-01-01), Kanzawa et al.
patent: 2004/0053438 (2004-03-01), Abe et al.
patent: 358095830 (1983-06-01), None
patent: 405024975 (1993-02-01), None
patent: 2002128596 (2002-05-01), None
patent: 2004018009 (2002-08-01), None
Frijouf Rust & Pyle P.A.
Mulpuri Savitri
LandOfFree
Apparatus and method for transformation of substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for transformation of substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for transformation of substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4099128