Silicon nitride capped shallow trench isolation method for...

Silicon nitride capped shallow trench isolation method for...

Silicon nitride hardstop encapsulation layer for STI region

Silicon shallow trench etching with round top corner by...

Silicon strain engineering accomplished via use of specific...

Silicon-enriched shallow trench oxide for reduced recess during

Silicon-on-insulator (SOI) transistor having partial hetero...

Silicon-ozone CVD with reduced pattern loading using...

Simplified method to reduce or eliminate STI oxide divots

Simplified shallow trench isolation formation with no polish sto

Soft edge induced local oxidation of silicon

Spin coating for maximum fill characteristic yielding a...

Spin coating for maximum fill characteristic yielding a...

SRAM cell having stepped boundary regions and methods of...

STI film property using SOD post-treatment

STI formation for vertical and planar transistors

STI formation in semiconductor device including SOI and bulk...

STI forming method for improving STI step uniformity

STI leakage reduction

STI process by method of in-situ multilayer dielectric...