Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Reexamination Certificate
2011-08-09
2011-08-09
Stark, Jarrett (Department: 2823)
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Grooved and refilled with deposited dielectric material
C438S786000, C257S296000, C257S774000
Reexamination Certificate
active
07994019
ABSTRACT:
Aspects of the disclosure pertain to methods of depositing conformal silicon oxide layers on patterned substrates. In embodiments, dielectric layers are deposited by flowing a silicon-containing precursor and ozone into a processing chamber such that a relatively uniform dielectric growth rate is achieved across the patterned substrate surface having heterogeneous materials and/or a heterogeneous pattern density distribution. The deposition of dielectric layers grown according to embodiments may have a reduced dependence on underlying material and pattern density while still being suitable for non-sacrificial applications. Reduction in dependence on pattern density is achieved by terminating deposition near the end of an incubation period. Multiple deposition cycles may be conducted in series since the beneficial nature of the incubation period may repeat after a pause in deposition.
REFERENCES:
patent: 4147571 (1979-04-01), Stringfellow et al.
patent: 4816098 (1989-03-01), Davis et al.
patent: 4818326 (1989-04-01), Liu et al.
patent: 4931354 (1990-06-01), Wakino et al.
patent: 5016332 (1991-05-01), Reichelderfer et al.
patent: 5110407 (1992-05-01), Ono et al.
patent: 5393708 (1995-02-01), Hsia et al.
patent: 5426076 (1995-06-01), Moghadam
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5587014 (1996-12-01), Leychika et al.
patent: 5622784 (1997-04-01), Okaue et al.
patent: 5635409 (1997-06-01), Moslehi
patent: 5691009 (1997-11-01), Sandhu
patent: 5786263 (1998-07-01), Perera
patent: 5853607 (1998-12-01), Zhao et al.
patent: 5937308 (1999-08-01), Gardner et al.
patent: 5937323 (1999-08-01), Orczyk et al.
patent: 6008515 (1999-12-01), Hsia et al.
patent: 6009830 (2000-01-01), Li et al.
patent: 6024044 (2000-02-01), Law et al.
patent: 6087243 (2000-07-01), Wang
patent: 6090723 (2000-07-01), Thakur et al.
patent: 6140242 (2000-10-01), Oh et al.
patent: 6146970 (2000-11-01), Witek et al.
patent: 6156581 (2000-12-01), Vaudo et al.
patent: 6165834 (2000-12-01), Agarwal et al.
patent: 6180490 (2001-01-01), Vassiliev et al.
patent: 6207587 (2001-03-01), Li et al.
patent: 6287962 (2001-09-01), Lin
patent: 6302964 (2001-10-01), Umotoy et al.
patent: 6383954 (2002-05-01), Wang et al.
patent: 6387207 (2002-05-01), Janakiraman et al.
patent: 6406677 (2002-06-01), Carter et al.
patent: 6448187 (2002-09-01), Yau et al.
patent: 6503557 (2003-01-01), Joret
patent: 6506253 (2003-01-01), Sakuma
patent: 6508879 (2003-01-01), Hashimoto
patent: 6509283 (2003-01-01), Thomas
patent: 6524931 (2003-02-01), Perera
patent: 6528332 (2003-03-01), Mahanpour et al.
patent: 6544900 (2003-04-01), Raaijmakers et al.
patent: 6548416 (2003-04-01), Han et al.
patent: 6548899 (2003-04-01), Ross
patent: 6559026 (2003-05-01), Rossman et al.
patent: 6566278 (2003-05-01), Harvey et al.
patent: 6589868 (2003-07-01), Rossman
patent: 6596654 (2003-07-01), Bayman et al.
patent: 6602806 (2003-08-01), Xia et al.
patent: 6614181 (2003-09-01), Harvey et al.
patent: 6624064 (2003-09-01), Sahin et al.
patent: 6630413 (2003-10-01), Todd
patent: 6645303 (2003-11-01), Frankel et al.
patent: 6660391 (2003-12-01), Rose et al.
patent: 6676751 (2004-01-01), Solomon et al.
patent: 6683364 (2004-01-01), Oh et al.
patent: 6716770 (2004-04-01), O'Neill et al.
patent: 6756085 (2004-06-01), Waldfried et al.
patent: 6787191 (2004-09-01), Hanahata et al.
patent: 6794290 (2004-09-01), Papasouliotis et al.
patent: 6818517 (2004-11-01), Maes
patent: 6819886 (2004-11-01), Runkowske et al.
patent: 6830624 (2004-12-01), Janakiraman et al.
patent: 6833052 (2004-12-01), Li et al.
patent: 6833322 (2004-12-01), Anderson et al.
patent: 6835278 (2004-12-01), Selbrede et al.
patent: 6858523 (2005-02-01), Deboer et al.
patent: 6867086 (2005-03-01), Chen et al.
patent: 6872323 (2005-03-01), Entley et al.
patent: 6890403 (2005-05-01), Cheung
patent: 6900067 (2005-05-01), Kobayashi et al.
patent: 6955836 (2005-10-01), Kumagai et al.
patent: 6958112 (2005-10-01), Karim et al.
patent: 7018902 (2006-03-01), Visokay et al.
patent: 7084076 (2006-08-01), Park et al.
patent: 7109114 (2006-09-01), Chen et al.
patent: 7115419 (2006-10-01), Suzuki
patent: 7122222 (2006-10-01), Xiao et al.
patent: 7129185 (2006-10-01), Aoyama et al.
patent: 7148155 (2006-12-01), Tarafdar et al.
patent: 7183177 (2007-02-01), Al-Bayati et al.
patent: 7192626 (2007-03-01), Dussarrat et al.
patent: 7205248 (2007-04-01), Li et al.
patent: 7220461 (2007-05-01), Hasebe et al.
patent: 7297608 (2007-11-01), Papasouliotis et al.
patent: 7335609 (2008-02-01), Ingle et al.
patent: 7399388 (2008-07-01), Moghadam et al.
patent: 7419903 (2008-09-01), Haukka et al.
patent: 7435661 (2008-10-01), Miller et al.
patent: 7456116 (2008-11-01), Ingle et al.
patent: 7498273 (2009-03-01), Mallick et al.
patent: 7524735 (2009-04-01), Gauri et al.
patent: 7524750 (2009-04-01), Nemani et al.
patent: 7541297 (2009-06-01), Mallick et al.
patent: 7745352 (2010-06-01), Mallick et al.
patent: 7790634 (2010-09-01), Munro et al.
patent: 7803722 (2010-09-01), Liang
patent: 7825038 (2010-11-01), Ingle et al.
patent: 7825044 (2010-11-01), Mallick et al.
patent: 7867923 (2011-01-01), Mallick et al.
patent: 7902080 (2011-03-01), Chen et al.
patent: 7935643 (2011-05-01), Liang et al.
patent: 7943531 (2011-05-01), Nemani et al.
patent: 2001/0021595 (2001-09-01), Jang et al.
patent: 2001/0029114 (2001-10-01), Vulpio et al.
patent: 2001/0038919 (2001-11-01), Berry et al.
patent: 2001/0054387 (2001-12-01), Frankel et al.
patent: 2002/0048969 (2002-04-01), Suzuki et al.
patent: 2002/0081817 (2002-06-01), Bhakta et al.
patent: 2002/0127350 (2002-09-01), Ishikawa et al.
patent: 2002/0142585 (2002-10-01), Mandal
patent: 2002/0146879 (2002-10-01), Fu et al.
patent: 2002/0164891 (2002-11-01), Gates et al.
patent: 2003/0040199 (2003-02-01), Agarwal
patent: 2003/0064154 (2003-04-01), Laxman et al.
patent: 2003/0118748 (2003-06-01), Kumagai et al.
patent: 2003/0124873 (2003-07-01), Xing et al.
patent: 2003/0143841 (2003-07-01), Yang et al.
patent: 2003/0159656 (2003-08-01), Tan et al.
patent: 2003/0172872 (2003-09-01), Thakur et al.
patent: 2003/0199151 (2003-10-01), Ho et al.
patent: 2003/0232495 (2003-12-01), Moghadam et al.
patent: 2004/0008334 (2004-01-01), Sreenivasan et al.
patent: 2004/0020601 (2004-02-01), Zhao et al.
patent: 2004/0048492 (2004-03-01), Ishikawa et al.
patent: 2004/0065253 (2004-04-01), Pois et al.
patent: 2004/0079118 (2004-04-01), M'Saad et al.
patent: 2004/0146661 (2004-07-01), Kapoor et al.
patent: 2004/0152342 (2004-08-01), Li et al.
patent: 2004/0161899 (2004-08-01), Luo et al.
patent: 2004/0175501 (2004-09-01), Lukas et al.
patent: 2004/0180557 (2004-09-01), Park et al.
patent: 2004/0185641 (2004-09-01), Tanabe et al.
patent: 2004/0219780 (2004-11-01), Ohuchi
patent: 2004/0241342 (2004-12-01), Karim et al.
patent: 2005/0001556 (2005-01-01), Hoffman et al.
patent: 2005/0019494 (2005-01-01), Moghadam et al.
patent: 2005/0026443 (2005-02-01), Goo et al.
patent: 2005/0062165 (2005-03-01), Saenger et al.
patent: 2005/0087140 (2005-04-01), Yuda et al.
patent: 2005/0142895 (2005-06-01), Ingle et al.
patent: 2005/0153574 (2005-07-01), Mandal
patent: 2005/0181555 (2005-08-01), Haukka et al.
patent: 2005/0186731 (2005-08-01), Derderian et al.
patent: 2005/0186789 (2005-08-01), Agarwal
patent: 2005/0196533 (2005-09-01), Hasebe et al.
patent: 2005/0227499 (2005-10-01), Park et al.
patent: 2005/0250340 (2005-11-01), Chen et al.
patent: 2006/0011984 (2006-01-01), Currie
patent: 2006/0014399 (2006-01-01), Joe
patent: 2006/0030165 (2006-02-01), Ingle et al.
patent: 2006/0055004 (2006-03-01), Gates et al.
patent: 2006/0068599 (2006-03-01), Baek et al.
patent: 2006/0075966 (2006-04-01), Chen et al.
patent: 2006/0096540 (2006-05-01), Choi
patent: 2006/0110943 (2006-05-01), Swerts et al.
patent: 2006/0121394 (2006-06-01), Chi
patent: 2006/0162661 (2006-07-01), Jung et al.
patent: 2006/0178018 (2006-08-01), Olsen
patent: 2006/0223315 (2006-10-01), Yokota et al.
patent: 2006/0228903 (2006-10-01), McSwiney et al.
patent: 2006/0281496 (2006-12-01), Cedraeus
patent: 2006/0286776 (2006-12-01), Ranish et al.
patent: 2007/0020392 (200
Gee Paul Edward
Kweskin Sasha
Sapre Kedar
Venkataraman Shankar
Applied Materials Inc.
Kilpatrick Townsend & Stockton LLP
Stark Jarrett
Tobergte Nicholas
LandOfFree
Silicon-ozone CVD with reduced pattern loading using... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silicon-ozone CVD with reduced pattern loading using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon-ozone CVD with reduced pattern loading using... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2704643