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Systems and methods for plasma etching

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Systems and methods of forming refractory metal nitride...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Systems and methods of forming refractory metal nitride...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Systems and methods of forming refractory metal nitride...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Systems and methods of forming refractory metal nitride...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Systems and methods of forming tantalum silicide layers

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Systems and methods to laminate passives onto substrate

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Systems and methods to retard copper diffusion and improve...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Systems for forming insulative coatings for via holes in...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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T-gate formation using a modified conventional poly process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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T-gate formation using modified damascene processing with...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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T-shaped gate electrode for reduced resistance

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Tailoring channel strain profile by recessed material...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Tailoring of a wetting/barrier layer to reduce...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Tantalum barrier layer for copper metallization

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Tantalum lanthanide oxynitride films

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Tantalum-containing barrier layers for copper

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Tape circuit board and semiconductor chip package including...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Tapered via using sidewall spacer reflow

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Tasin oxygen diffusion barrier in multilayer structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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