Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-08-31
2009-06-09
Lebentritt, Michael S (Department: 2829)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S591000, C438S641000, C438S674000, C438S785000, C257SE21013, C257SE21021, C257SE21168, C257SE21171, C257SE21197, C257SE21209, C257SE21274, C257SE21396, C257SE27087, C257SE29302
Reexamination Certificate
active
07544604
ABSTRACT:
Electronic apparatus and methods of forming the electronic apparatus include a tantalum lanthanide oxynitride film on a substrate for use in a variety of electronic systems. The tantalum lanthanide oxynitride film may be structured as one or more monolayers. Metal electrodes may be disposed on a dielectric containing a tantalum lanthanide oxynitride film.
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patent:
Ahn Kie Y.
Bhattacharyya Arup
Forbes Leonard
Lebentritt Michael S
Micro)n Technology, Inc.
Schwegman Lundberg & Woessner, P.A.
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