Integrated circuit which uses a damascene process for producing
Integrated circuit wiring and fabricating method thereof
Integrated circuit with a metal silicide film uniformly formed
Integrated circuit with a recessed conductive layer
Integrated circuit with a reduced pad bump area and the...
Integrated circuit with differing gate oxide thickness and proce
Integrated circuit with improved contact barrier
Integrated circuit with improved interconnect structure and...
Integrated circuit with metal layer having carbon nanotubes...
Integrated circuit with modified metal features and method...
Integrated circuit with planarized dielectric layer between succ
Integrated circuit with reverse engineering protection
Integrated circuit with self-aligned line and via and...
Integrated circuit with simultaneous fabrication of dual...
Integrated circuit with stop layer and associated...
Integrated circuit with stop layer and method of...
Integrated circuit with substantially perpendicular wire bonds
Integrated circuit, and method for forming an integrated circuit
Integrated circuit, intermediate structure and a method of...
Integrated circuitry and a semiconductor processing method...