Integrated circuit, intermediate structure and a method of...

Details Integrated circuit, intermediate structure and a method of... Integrated circuit, intermediate structure and a method of...

2007-06-29

2010-12-28

Graybill, David E (Department: 2894)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S700000, C438S682000

Reexamination Certificate

active

07858514

ABSTRACT:
In a method of fabricating a semiconductor structure, a carbon containing mask is fabricated over a dielectric layer. The mask exposes the surface of the dielectric layer at least partly in a region between two adjacent conducting lines. A contact hole is etched into the dielectric layer in the region between the two adjacent conducting lines.

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