Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-03-07
2006-03-07
Ngô, Ngân V. (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S151000, C438S183000, C438S630000
Reexamination Certificate
active
07008873
ABSTRACT:
Technique and structures for camouflaging an integrated circuit structure. The integrated circuit structure is formed by a plurality of layers of material having controlled outlines and controlled thicknesses. A layer of dielectric material of a controlled thickness is disposed among said plurality of layers to thereby render the integrated circuit structure intentionally inoperable.
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Baukus James P.
Chow Lap-Wai
Clark Jr. William M.
HRL Laboratories LLC
Ladas & Parry LLP
Ngo Ngan V.
Raytheon Company
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