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Dual metal integration scheme based on full silicidation of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual metal interconnects for improved gap-fill, reliability,...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual metal stud bumping for flip chip applications

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual metal-oxide layer as air bridge

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual process semiconductor heterostructures and methods

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual salicidation process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Dual salicidation process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Dual salicide process for optimum performance

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual salicides for integrated circuits

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Dual seal deposition process chamber and process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual silicide process to reduce gate resistance

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual silicide semiconductor fabrication process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Dual width contact for charge gain reduction

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual workfunction silicide diode

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual-damascene dielectric structures and methods for making...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual-damascene interconnect structures and methods of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual-damascene process and associated floating metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual-damascene process with porous low-K dielectric material

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual-level metalization method for integrated circuit ferroelect

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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Dual-rie structure for via/line interconnections

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
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