Dual seal deposition process chamber and process

Details Dual seal deposition process chamber and process Dual seal deposition process chamber and process

2006-10-03

2010-06-15

Estrada, Michelle (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C029S025010, C118S715000, C118S7230VE

Reexamination Certificate

active

07737035

ABSTRACT:
An apparatus and method for sealing and unsealing a chemical deposition apparatus in a chemical deposition process chamber includes a microvolume that has dual sealing elements at its periphery. One seal, the outer seal, is used to seal the inside of the microvolume from the main process chamber. The second (inner) seal is used to seal the inside of the microvolume from a vacuum source. The apparatus and process of the present invention has several advantages for enhanced chamber performance.

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