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SiCOH film preparation using precursors with built-in...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silane treatment of low dielectric constant materials in...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silica membranes and process of production thereof

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silica microstructure and fabrication method thereof

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Silica thin films produced by rapid surface catalyzed vapor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silica-based film, method of forming the same, composition...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Silicon carbide cap layers for low dielectric constant...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Silicon carbide deposition for use as a low dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Silicon carbide deposition for use as a low-dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Silicon carbide having low dielectric constant

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silicon dioxide deposition methods using at least ozone and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Silicon dioxide deposition methods using at least ozone and...

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Silicon dioxide-oxynitride continuity film as a passivation...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Silicon germanium surface layer for high-k dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silicon nitride and silicon dioxide gate insulator...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Silicon nitride and silicon dioxide gate insulator...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Silicon nitride deposition method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silicon nitride deposition method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silicon nitride deposition method for use in forming a memory ce

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Silicon nitride film formation method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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