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Planarization of non-planar surfaces in device fabrication

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Planarization process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Planarization using plasma oxidized amorphous silicon

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma chamber equipped with temperature-controlled focus...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Plasma composition for selective high-k etch

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma CVD method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma CVD method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma CVD method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma CVD method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma CVD method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma deposition of spin chucks to reduce contamination of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Plasma detemplating and silanol capping of porous dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Combined with the removal of material by nonchemical means
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Plasma enhanced atomic layer deposition system and method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Plasma enhanced atomic layer deposition system and method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Plasma enhanced atomic layer deposition system and method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Plasma enhanced chemical vapor deposition (PECVD) method for...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Plasma enhanced chemical vapor deposition apparatus and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Plasma enhanced chemical vapor deposition apparatus and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Plasma enhanced chemical vapor deposition process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Plasma enhanced CVD low k carbon-doped silicon oxide film...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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