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High density plasma and bias RF power process to make stable...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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High density plasma chemical vapor deposition (HDP-CVD)...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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High density plasma chemical vapor deposition process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High density plasma passivation layer and method of application

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High density plasma process for optimum film quality and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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High density plasma process for silicon thin films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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High density plasma process for the formation of silicon...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant material deposition to achieve high...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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High dielectric constant materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant metal oxide gate dielectrics

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant metal oxide gate dielectrics

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High efficiency photoresist coating

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High modulus filler for low k materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High performance CMOS transistors using PMD liner stress

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High performance MIS capacitor with HfO 2 dielectric

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High quality silicon oxide films by remote plasma CVD from...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High quantum efficiency silicon nanoparticle embedded SiO X...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High rate silicon dioxide deposition at low pressures

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High rate silicon nitride deposition method at low pressures

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