Radiation hardened dielectric for EEPROM
Rapid acceleration methods for global planarization of...
Rapid deposition of borosilicate glass films
Reactor for processing a workpiece using sonic energy
Reactor precoating for reduced stress and uniform CVD
Recovery of hydrophobicity of low-k and ultra low-k...
Reduced particulate etching
Reducing line to line capacitance using oriented dielectric...
Reduction of charge loss in nonvolatile memory cells by phosphor
Reduction of etch-rate drift in HDP processes
Reduction of mobile ion and metal contamination in HDP-CVD chamb
Reduction of n-channel parasitic transistor leakage by using low
Reduction of plasma damage for HDP-CVD PSG process
Reduction of shrinkage of poly(arylene ether) for low-K IMD
RELACS process to double the frequency or pitch of small...
Remote plasma source seasoning
Removable amorphous carbon CMP stop
Removable amorphous carbon CMP stop
Removable amorphous carbon CMP stop
Removal of carbon from an insulative layer using ozone