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Variable flow deposition apparatus and method in...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Variable stoichiometry silicon nitride barrier films for...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Varying TEOS flow rate while forming intermetallic insulating la

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Vertical plasma processing method for forming silicon...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Very low dielectric constant plasma-enhanced CVD films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Very low dielectric constant plasma-enhanced CVD films

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Very low dielectric constant plasma-enhanced CVD films

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VLSI fabrication processes for introducing pores into...

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Void free interlayer dielectric

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