H2-based plasma treatment to eliminate within-batch and...
H2-or H2/N2-plasma treatment to prevent organic ILD degradation
Hafnium lanthanide oxynitride films
Hafnium tantalum oxynitride dielectric
HDP deposition hillock suppression method in integrated...
HDP process for high aspect ratio gap filling
HDP-CVD deposition process for filling high aspect ratio gaps
HDP-CVD deposition process for filling high aspect ratio gaps
HDP-CVD method for forming passivation layers with enhanced...
He treatment to improve low-k adhesion property
Heat processing method and apparatus for semiconductor process
Heat treatment apparatus, heat treatment method, and...
Heat treatment of a tantalum oxide film
Hermetic cap layers formed on low-k films by plasma enhanced...
Hermetic silicon carbide
High crack resistance nitride process
High density plasma chemical vapor deposition process
High density plasma passivation layer and method of application
High density plasma process for the formation of silicon...
High dielectric constant materials