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Simulation method for high resolution deep impurity profile

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
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Single ion implantation system

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
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Slit double gap buncher and method for improved ion bunching...

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Soft vacuum electron beam patterning apparatus and process

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
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Source inner shield for eaton NV-10 high current implanter

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Source inner shield for eaton NV-10 high current implanter

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Source multiplexing in lithography

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
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Space-saving ion-implantation system installed both in and adjac

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Spatial phase locking with shaped electron beam lithography

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Spectrum analyzer in an ion implanter

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Spectrum analyzer in an ion implanter

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Spinning reticle scanning projection lithography exposure system

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SPM base focal plane positioning

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Stabilizing support mechanism for electron beam apparatus

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Stage apparatus, lithographic apparatus and device...

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Stage device for an exposure apparatus and semiconductor device

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Stage device for an exposure apparatus and semiconductor device

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Stage device, control system, and method for stabilizing...

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Stencil mask and charge particle beam exposure method and appara

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Stencil reticle incorporating scattering features for...

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